Photomask example sentences

Related (14): reticles, lithography, semiconductor, pattern, exposure, resolution, etching, transparency, alignment, submicron, layers, fabrication, microlithography, optical

"Photomask" Example Sentences

1. The photomask is used for patterning the semiconductor material.
2. The company produces highly precise photomasks.
3. The photomask is made of a thin layer of chromium.
4. The photomask must be aligned accurately for proper patterning.
5. The photomask is used in the lithography process.
6. The photomask is an important tool in the fabrication of electronic devices.
7. The photomask is created using a photolithography process.
8. The photomask is used to ensure that patterns are accurately transferred onto the substrate.
9. The photomask must be prepared with extremely high resolution and accuracy.
10. The photomask is a crucial component in the production of microchips.
11. The photomask is used to create intricate patterns on the substrate.
12. The photomask is used in the semiconductor industry to manufacture integrated circuits.
13. The photomask is placed in close proximity to the substrate during patterning.
14. The quality of the photomask greatly affects the quality of the final product.
15. The photomask is etched with the desired pattern prior to use.
16. The photomask is exposed to UV light during the patterning process.
17. The photomask is used to transfer a pattern from the master to the substrate.
18. The photomask is used in the production of many electronic components.
19. The photomask is a critical component in semiconductor manufacturing.
20. The photomask is inspected for defects and flaws before use.
21. The photomask is designed with extreme precision to ensure accuracy.
22. The photomask is used to create high-resolution patterns on the substrate.
23. The photomask is often compared to a stencil in its function.
24. The photomask is used in the creation of microelectromechanical systems.
25. The quality of the photomask determines the quality of the final product.
26. The photomask is an essential component in many advanced manufacturing processes.
27. The photomask is used to create precise patterns on the substrate.
28. The photomask is a fundamental component in the creation of transistors and other electronic devices.
29. The photomask is an example of a tool used in modern lithography.
30. The photomask is a critical element in the production of many high-tech products.

Common Phases

1. Designing photomask patterns;
2. Transferring photomask patterns onto silicon wafers;
3. Aligning multiple photomasks for complex patterns;
4. Developing photomasks for advanced lithography techniques;
5. Inspecting photomasks for manufacturing defects;
6. Repairing photomasks to fix defects and ensure accuracy;
7. Optimizing photomask designs for high-volume production;
8. Testing photomasks for durability and longevity;
9. Cleaning photomasks to maintain integrity and prevent contamination;
10. Storing photomasks in controlled environments to extend lifespan.

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